Modification and simulation of the power supply of a metal vapor laser

International Conference on Mechanical Engineering, Automation and Control Systems 2015

机械制造;无线电电子学;计算机科学

Ogorodnikov, D.N.^1 ; Trigub, M.V.^1,2 ; Torgaev, S.N.^1,2,3 ; Vasnev, N.A.^1 ; Evtushenko, T.G.^3

National Research Tomsk Polytechnic University, 30, Lenina ave., Tomsk

634050, Russia^1

V e Zuev Institute of Atmospheric Optics Siberian Branch of the Russian Academy of Sciences, 1, Academician Zuev sq., Tomsk

634055, Russia^2

National Research Tomsk State University, 36, Lenina ave., Tomsk

634050, Russia^3

关键词: Average output power;    Capacitance ratio;    Charging process;    High pulse repetition frequency;    Metal vapor lasers;    Power supply;    Storage capacitor;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/124/1/012030/pdf
DOI  :  10.1088/1757-899X/124/1/012030

学科分类：计算机科学（综合）

来源: IOP

【 摘 要 】

The modification of a power supply circuit used for pumping metal vapor lasers is analyzed. The results of OrCAD simulation of the processes that occur in the power supply are presented. The effect of the capacitance ratio on the charging process of a storage capacitor is described. The mode which provides more time for the recovery of the thyratron is discussed. The results of the development of the small-size high pulse repetition frequency laser with up to 3 W average output power are presented.