The influence of some model parameters on the impurity distribution implanted into substrate surface

International Conference on Mechanical Engineering, Automation and Control Systems 2015

机械制造;无线电电子学;计算机科学

Parfenova, E.S.^1 ; Knyazeva, A.G.^1

Institute of High Technology Physics, Tomsk Polytechnic University, 2a, Lenina ave., Tomsk

634050, Russia^1

关键词: Composition changes;    Coupled problems;    Diffusion process;    Impurity concentration;    Impurity distribution;    Mass transfer phenomena;    Particle diffusion;    Substrate surface;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/124/1/012085/pdf
DOI  :  10.1088/1757-899X/124/1/012085

学科分类：计算机科学（综合）

来源: IOP

【 摘 要 】

The model for description of the initial stage of ion implantation into the surface layer of the metal is presented. The interdependence of embedded impurity concentration and deformations arising from the impact of particles on the surface is investigated. The model takes into account the particle diffusion, the finite time of mass flux relaxation; the stress appearance due to a composition change of the surface layer and a mass transfer phenomenon under a stress gradient action. It is established that the interaction of mechanical waves and concentration leads to a distribution of concentration not corresponding to a pure diffusion process. The examples of coupled problems solution for different sets of model parameters are presented.