Effects of thermomechanical processing on the recrystallization texture and grain size of Al-1%Si sputtering target material

17th International Conference on Textures of Materials

材料科学;物理学

Li, X.R.^1 ; Xu, C.L.^1 ; Huang, T.L.^1 ; Luo, Y.^1 ; Wu, G.L.^1 ; Liu, Q.^1 ; Huang, X.^1,2

College of Materials Science and Engineering, Chongqing University, Chongqing

400045, China^1

Department of Wind Energy, Technical University of Denmark, Risø Campus, Roskilde

4000, Denmark^2

关键词: Al-1%Si alloys;    Annealed samples;    Electron back scatter diffraction;    Optimal conditions;    Recrystallization texture;    Sputtering target;    Textured grains;    Thermo-mechanical processing;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/82/1/012065/pdf
DOI  :  10.1088/1757-899X/82/1/012065

学科分类：材料科学（综合）

来源: IOP

【 摘 要 】

An Al-1%Si alloy was solution treated and deformed by conventional cold rolling to different strains, followed by annealing at various temperatures until complete recrystallization. The microstructures of annealed samples were characterized by electron backscatter diffraction. It is found that under optimal conditions of cold rolling and annealing, the microstructure desired for sputtering target materials with fine, uniformly sized and randomly textured grains can be obtained for the Al-1%Si alloy.