The Effect of Substrate Temperature on the Structure and Magnetic Properties of Cobalt Films Deposited by CVD

20th International Conference for Students and Young Scientists: Modern Techniques and Technologies

工业技术;材料科学

Hairullin, R.^1 ; Dorovskikh, S.^2

National Research Tomsk Polytechnic University, Tomsk

634050, Russia^1

Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk

630090, Russia^2

关键词: Chemical compositions;    Coherent scattering region;    Deposition conditions;    Electrical characteristic;    Energy dispersive X ray spectroscopy;    Magnetic characteristic;    Structural parameter;    Substrate temperature;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/66/1/012023/pdf
DOI  :  10.1088/1757-899X/66/1/012023

来源: IOP

【 摘 要 】

In this work the effect of substrate temperature on the structural parameters (sizes of coherent scattering region, values of microstresses), phase and chemical composition, surface morphology of Co films is revealed. Moreover, the correlation between structure, cobalt content and magnetic, electrical characteristics of Co films is presented. Co films were deposited on Si (100) substrates by chemical vapor deposition using the diiminate complex Co(N'acN'ac)2as a precursor. The sizes of coherent scattering region, values of microsresses and phase composition of Co films were determined by the X-ray diffraction analysis. The chemical composition was identified by the Energy-dispersive X-ray spectroscopy. The surface morphology of Co films was investigated by atomic-force microscope. Magnetic characteristics were measured by vibromagnetometer and the electrical resistivity was measured by four-probe dc method. It is found that the variation of deposition conditions allows widely changing structural parameters and chemical composition of Co films.