Simulation of the effect of incline incident angle in DMD Maskless Lithography

6th conference on Advances in Optoelectronics and Micro/nano-optics

Liang, L.W.^1 ; Zhou, J.Y.^1 ; Xiang, L.L.^1 ; Wang, B.^1 ; Wen, K.H.^1 ; Lei, L.^1

School of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou

510006, China^1

关键词: Angular spectrum method;    Aperture function;    Digital micro-mirror device;    Illumination distribution;    Intensity fluctuations;    Mask-less lithography;    Micro-lens arrays;    Spatial frequency domains;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/844/1/012031/pdf
DOI  :  10.1088/1742-6596/844/1/012031

来源: IOP

【 摘 要 】

The aim of this study is to provide a simulation method for investigation of the intensity fluctuation caused by the inclined incident angle in DMD (digital micromirror device) maskless lithography. The simulation consists of eight main processes involving the simplification of the DMD aperture function and light propagation utilizing the non-parallel angular spectrum method. These processes provide a possibility of co-simulation in the spatial frequency domain, which combines the microlens array and DMD in the maskless lithography system. The simulation provided the spot shape and illumination distribution. These two parameters are crucial in determining the exposure dose in the existing maskless lithography system.