The influence of repetitively pulsed plasma immersion low energy ion implantation on TiN coating formation and properties

5th International Congress on Energy Fluxes and Radiation Effects 2016

Sivin, D.O.^1 ; Ananin, P.S.^1 ; Dektyarev, S.V.^1 ; Ryabchikov, A.I.^1 ; Shevelev, A.E.^1

National Research Tomsk Polytechnic University, 30 Lenin Avenue, Tomsk

634050, Russia^1

关键词: Coating deposition;    High frequency HF;    Low energy ion implantation;    Production rates;    Pulse frequencies;    Surface density;    Titanium nitride coating;    Tribological properties;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/830/1/012103/pdf
DOI  :  10.1088/1742-6596/830/1/012103

来源: IOP

【 摘 要 】

Application of high frequency short pulse plasma immersion low energy ion implantation for titanium nitride coating deposition using vacuum arc metal plasma and hot-cathode gas-discharge plasma on R6M5 alloy was investigated. Implementation of negative repetitively pulsed bias with bias amplitude 2 kV, pulse duration 5 μs and pulse frequency 105Hz leads to 6.2-fold decrease of vacuum arc macroparticle surface density for macroparticles with diameter less than 0.5 μm. Ion sputtering due coating deposition reduces the production rate approximately by 30%. It was found that with bias amplitude range from 1.1 to 1.4 kV and pulse duration 5 μs yields to formation of coatings with local hardness up to 40 GPa. This paper presents the results of experimental studies of adhesion strength, tribological properties and surface morphology of deposited TiN coatings.