Legitimacies of the growth of oxide films on ion-modified samples from the alloy E110 at high-temperature oxidation

5th International Congress on Energy Fluxes and Radiation Effects 2016

Kalin, B.A.^1 ; Volkov, N.V.^1 ; Valikov, R.A.^1 ; Yashin, A.S.^1 ; Ignatiyev, D.N.^1

National Research Nuclear University MEPhI (Moscow Engineering Physics Institute), 31 Kashirskoe shosse, Moscow

115409, Russia^1

关键词: Basis of calculation;    Element compositions;    Hydrogenation rate;    Magnetron deposition;    Near-surface layers;    Operation conditions;    Polished surfaces;    X-ray microanalysis;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/830/1/012085/pdf
DOI  :  10.1088/1742-6596/830/1/012085

来源: IOP

【 摘 要 】

The possibility to obtain barrier layers during the surface modification by ion-plasma to decrease the oxidation and hydrogenation rate of fuel claddings from zirconium alloys at various operation conditions is studied in this paper. Fuel claddings from the alloy E110 obtained on the outer surface of fuel elements after ion polishing are determined on the basis of calculations and experiments performed: the average ion energy in a beam is 3-4 keV, the ion current is 0.4-0.7 mA cm-2, and the total irradiation dose is 5×1018ion cm-2. Cleaning and polishing of samples from the alloy E110 were carried out on the installation ILUR-03 by a radial beam of argon ions with a wide energy spectrum. Thin films (up to 100 nm) of alloying elements - Fe, Al, Mo, Y, Mg, and Cr were obtained on the polished surface by magnetron deposition and then implanted into the near-surface layer under the influence of a radial beam of argon ions. Study of the element composition of cleaned and modified near-surface layers was performed by X-ray microanalysis. A part of the samples was preliminarily autoclaved in distilled water at the temperature of 350 °C and the pressure of 17 MPa for 500 h to obtain a protective layer from an oxide film enriched by implanted elements. It is shown that alloying elements are mostly located at the oxide-metal boundary and in the oxide.