Plasma reactor for deposition of carbon nanowalls at atmospheric pressure

6th International Workshop & Summer School on Plasma Physics 2014

Dimitrov, Zh^1 ; Mitev, D.^1 ; Kiss'Ovski, Zh^1

Faculty of Physics, Sofia University St. Kliment Ohridski, 6 James Boucher Blvd, Sofia, Bulgaria^1

关键词: Carbon Nanostructures;    Carbon nanowalls;    Chemical compositions;    Emission spectrums;    Metal substrate;    Mixture effects;    Plasma reactors;    Vertical growth;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/768/1/012017/pdf
DOI  :  10.1088/1742-6596/768/1/012017

来源: IOP

【 摘 要 】

In this study a novel plasma reactor for deposition of carbon nanowalls at atmospheric pressure is constructed and characterized. A low power microwave discharge is used as a plasma source and working gas of Ar/H2/CH4gas mixture. The substrate is heated by plasma flame and its temperature is in the range 600-700 C. The chemical composition of the plasma and the gas mixture effect on the concentration of the various particles in the plasma is investigated by optical emission spectroscopy. The emission spectrum of the plasma jet in Ar/H2/CH4mixture shows the presence of carbon (Swan band) and an intensive line of CH (388 nm), which are necessary species for deposition of carbon nanostructures. Additional voltage in the range from -20 V to -100 V is applied in order to ensure the vertical growth of graphene walls. Results of deposited carbon nanostructures on metal substrate are shown.