High-rate deposition of silicon films in a magnetron discharge with liquid target

6th International Workshop & Summer School on Plasma Physics 2014

Tumarkin, A.^1 ; Zibrov, M.^1 ; Khodachenko, G.^1 ; Tumarkina, D.^2

National Research Nuclear University MEPhI (Moscow Engineering Physics Institute), Kashirskoe shosse 31, Moscow

115409, Russia^1

Moscow State University, Moscow

119991, Russia^2

关键词: Coating structures;    Deposited coatings;    High carbon steels;    High-rate deposition;    Magnetron discharges;    Protective properties;    Silicon coatings;    Substrate bias voltages;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/768/1/012015/pdf
DOI  :  10.1088/1742-6596/768/1/012015

来源: IOP

【 摘 要 】

Silicon coatings have been deposited on substrates made of low-carbon and high- carbon steels and tungsten in a magnetron discharge with liquid target at substrate bias voltages ranging from +100 V to -600 V. The structure of obtained coatings was examined by a scanning electron microscopy. The strong influence of substrate bias voltage on the coating structure was observed. The corrosion resistance of coated steel samples was examined in concentrated sulphuric, hydrochloric and nitric acids and their solutions. The resistance of coated tungsten samples against high-temperature oxidation was examined by their exposure to O2gas at a pressure of 0.2 Pa and a temperature of 1073 K. The coatings deposited under bias voltages of+100 V and -600 V had dense structures and showed the best protective properties among all deposited coatings.