Differences observed in the surface morphology and microstructure of Ni-Fe-Cu ternary thin films electrochemically deposited at low and high applied current densities

International Conference on Quantum Science and Applications 2016

Sarac, U.^1 ; Kaya, M.^2 ; Baykul, M.C.^2

Department of Science Education, Bartin University, Bartm

74100, Turkey^1

Department of Physics, Eskisehir Osmangazi University, Eskisehir

26480, Turkey^2

关键词: Anomalous codeposition;    Crystallographic structure;    Electrochemical deposition process;    Energy dispersive X ray spectroscopy;    Face-centered cubic;    High current densities;    Micro-structural properties;    Particle size and surfaces;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/766/1/012025/pdf
DOI  :  10.1088/1742-6596/766/1/012025

来源: IOP

【 摘 要 】

In this research, nanocrystalline Ni-Fe-Cu ternary thin films using electrochemical deposition technique were produced at low and high applied current densities onto Indium Tin Oxide (ITO) coated conducting glass substrates. Change of surface morphology and microstructural properties of the films were investigated. Energy dispersive X-ray spectroscopy (EDX) measurements showed that the Ni-Fe-Cu ternary thin films exhibit anomalous codeposition behaviour during the electrochemical deposition process. From the X-ray diffraction (XRD) analyses, it was revealed that there are two segregated phases such as Cu- rich and Ni-rich within the films. The crystallographic structure of the films was face-centered cubic (FCC). It was also observed that the film has lower lattice micro-strain and higher texture degree at high applied current density. Scanning electron microscopy (SEM) studies revealed that the films have rounded shape particles on the base part and cauliflower-like structures on the upper part. The film electrodeposited at high current density had considerably smaller rounded shape particles and cauliflower-like structures. From the atomic force microscopy (AFM) analyses, it was shown that the film deposited at high current density has smaller particle size and surface roughness than the film grown at low current density.