Optical, structural and electrochromic properties of sputter- deposited W-Mo oxide thin films

INERA Conference: Vapor Phase Technologies for Metal Oxide and Carbon Nanostructures

物理学;材料科学

Gesheva, K.^1 ; Arvizu, M.A.^2 ; Bodurov, G.^1 ; Ivanova, T.^1 ; Niklasson, G.A.^2 ; Iliev, M.^3 ; Vlakhov, T.^3 ; Terzijska, P.^3 ; Popkirov, G.^1 ; Abrashev, M.^4 ; Boyadjiev, S.^3,5 ; Jágerszki, G.^5 ; Szilágyi, I.M.^5,6 ; Marinov, Y.^3

Central Laboratory of Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, 72 Tzarigradsko chaussee, Sofia

1784, Bulgaria^1

Department of Engineering Sciences, Ångström Laboratory, Uppsala University, P.O. Box 534, Uppsala

SE-751 21, Sweden^2

Institute of Solid State Physics, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee blvd., Sofia

1784, Bulgaria^3

Faculty of Physics, Sofia University, Blvd. J. Bauchier 5, Bulgaria^4

MTA-BME Technical Analytical Chemistry Research Group, Szent Gellért tér 4, Budapest

H-1111, Hungary^5

Department of Inorganic and Analytical Chemistry, Budapest University of Technology and Economic, Szent Gellért tér 4, Budapest

H-1111, Hungary^6

关键词: Characterization techniques;    Chemical compositions;    Electrochromic properties;    Impedance spectroscopy;    Optoelectronic properties;    Reactive DC magnetron sputtering;    Thin metaloxide films;    Visible spectral range;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/764/1/012010/pdf
DOI  :  10.1088/1742-6596/764/1/012010

学科分类：材料科学（综合）

来源: IOP

【 摘 要 】

Thin metal oxide films were investigated by a series of characterization techniques including impedance spectroscopy, spectroscopic ellipsometry, Raman spectroscopy, and Atomic Force Microscopy. Thin film deposition by reactive DC magnetron sputtering was performed at the Ångström Laboratory. W and Mo targets (5 cm diameter) and various oxygen gas flows were employed to prepare samples with different properties, whereas the gas pressure was kept constant at about 30 mTorr. The substrates were 55 cm2plates of unheated glass pre-coated with ITO having a resistance of 40 ohm/sq. Film thicknesses were around 300 nm as determined by surface profilometry. Newly acquired equipment was used to study optical spectra, optoelectronic properties, and film structure. Films of WO3and of mixed W- Mo oxide with three compositions showed coloring and bleaching under the application of a small voltage. Cyclic voltammograms were recorded with a scan rate of 5 mV s-1. Ellipsometric data for the optical constants show dependence on the amount of MoOx in the chemical composition. Single MoOx film, and the mixed one with only 8% MoOx have the highest value of refractive index, and similar dispersion in the visible spectral range. Raman spectra displayed strong lines at wavenumbers between 780 cm-1and 950 cm-1related to stretching vibrations of WO3, and MoO3. AFM gave evidence for domains of different composition in mixed W-Mo oxide films.