Deposition of materials using a plasma focus of tens of joules

19th Chilean Physics Symposium 2014

Inestrosa-Izurieta, M.J.^1,2 ; Jauregui, P.^3 ; Soto, L.^1,2

Comisión Chilena de Energía Nuclear, Casilla Santiago

188-D, Chile^1

Center for Research and Applications in Plasma Physics and Pulsed Power, P4, Chile^2

Facultad de Ciencia, Universidad de Santiago de Chile, Santiago, Chile^3

关键词: Anode material;    Axial direction;    High energy densities;    Material deposition;    Metallic inserts;    Short durations;    Synthesis of new materials;    Transient plasmas;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/720/1/012045/pdf
DOI  :  10.1088/1742-6596/720/1/012045

来源: IOP

【 摘 要 】

Physical properties of transient plasmas, energetic ions and electrons, as produced in plasma focus (PF) discharges are substantially different than the conventional plasma devices used for plasma nanofabrication. In particular, PF discharges provide new and unique opportunities in processing and synthesis of new materials. Since PF discharges have very short duration and produce plasmas of high ion density, the anode is exposed to a high energy density causing its pulverization and generating a vapour of material that allows a fast deposit. In this paper a table top plasma focus of tens of joules, PF-50J, was used to produce material deposition. First deposits obtained from detached anode material (steel) or a metallic insert (titanium) from the plasma ejected after the pinch in the axial direction are presented.