Plasmachemical Conservation of Corroded Metallic Objects

5th International Workshop & Summer School on Plasma Physics 2012

Sazavska, Vera^1 ; Balastikova, Radka^1 ; Krcma, Frantisek^1 ; Radkova, Lucie^1 ; Fojtikova, Petra^1 ; Prikryl, Radek^1 ; Prochazka, Michal^1

Faculty of Chemistry, Brno University of Technology, Purkyova 118, Brno

612 00, Czech Republic^1

关键词: Barrier properties;    Chemical vapor deposition methods;    Corrosion products;    High-density films;    Low-pressure hydrogen;    Plasma enhanced chemical vapour depositions (PECVD);    Plasma-chemical process;    Radio frequencies;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/715/1/012012/pdf
DOI  :  10.1088/1742-6596/715/1/012012

来源: IOP

【 摘 要 】

Plasmachemical process for conservation of metallic objects is a new way of effective and fast treatment of corroded objects. This process consists of two main steps: corrosion removal and deposition of a protecting film. Removal of corrosion products is based on plasmachemical reduction of corrosion layers by radio-frequency (RF) low pressure hydrogen plasma. Chosen barrier films are parylene (poly-para-xylylene) coatings and SiO2- like high density films. Parylene coatings are prepared by a standard chemical vapor deposition (CVD) method. Plasma enhanced chemical vapour deposition (PECVD) enables preparation of SiOxbased thin films with higher flexibility due to variable incorporated organics groups. The coatings were characterized by various methods in order to obtain information about their chemical structure (FTIR) and barrier properties (OTR). The results from standard corrosion test were compared with those on samples treated by conventional conservation procedures.