Detection of powder formation in SiH4/H2 glow discharges

19th International Summer School on Vacuum, Electron and Ion Technologies

Alexiou, G.^1 ; Tsigaras, G.^1 ; Amanatides, E.^1 ; Mataras, D.^1

Plasma Technology Laboratory, Department of Chemical Engineering, University of Patras, Greece^1

关键词: Nucleation and coagulations;    Particle formations;    Powder formation;    Silicon thin film;    Steady state;    Time-resolved;    Total gas pressure;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/700/1/012038/pdf
DOI  :  10.1088/1742-6596/700/1/012038

来源: IOP

【 摘 要 】

Time-resolved self-bias voltage measurements and spatiotemporal resolved optical emission spectroscopy were used in order to monitor particle formation and instabilities in the initial stage of 13.56 MHz SiH4/H2. The effect of total gas pressure on the particles formation and the time required for the plasma to reach steady state was investigated. Both techniques were very sensitive in monitoring the nucleation and coagulation phase of particles formation. The characteristic times required for reaching steady state were similar for both techniques indicating that electrical properties and chemical kinetics are affected in a similar way from particle formation. The increase of pressure resulted in a significant shortening of the instability period and this can be a significant advantage in the deposition of device grade silicon thin films.