Current-pressure characteristics of dc magnetron discharge for high-rate sputtering

30th International Conference on Interaction of Intense Energy Fluxes with Matter

Serov, A.O.^1,2 ; Mankelevich, Yu.A.^1 ; Pal, A.F.^1,2 ; Ryabinkin, A.N.^1,2

Skobeltsyn Institute for Nuclear Physics, Lomonosov Moscow State University, Leninskiye Gory 1, Moscow

119899, Russia^1

State Research Center of the Russian Federation, Troitsk Institute for Innovation and Fusion Research, Pushkovykh Street 12, Troitsk, Moscow

142190, Russia^2

关键词: Aluminum cathode;    Axially symmetric;    Different pressures;    Discharge current density;    High rate sputtering;    Magnetron discharges;    Pressure characteristics;    Sputtered atoms;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/653/1/012127/pdf
DOI  :  10.1088/1742-6596/653/1/012127

来源: IOP

【 摘 要 】

The current-pressure (I-P) characteristics of axially symmetric dc discharge of planar magnetron sputter were studied. The characteristics in argon and krypton gases for copper and aluminum cathodes and the spatial distributions of the plasma glow at different pressures are obtained. The sequence of local maximum and minimum is observed on current- pressure characteristics under defined conditions. The necessity of taking into account the gas heating by sputtered atoms for explaining the observed features of I-P characteristics is shown. Numerical simulation has allowed explaining the observed significant difference between the values of the discharge current density in argon and krypton.