Focused Electron Beam Induced Deposition of 1,1-dichloro-1-silacyclohexane, silacyclohexane and 1,3,5-trisilacyclohexane; preliminary study on the role of low energy secondary electrons in the deposition process

29th International Conference on Photonic, Electronic, and Atomic Collisions

Ingólfsson, Oddur^1 ; Tp, Ragesh Kumar^1 ; Hagen, Cornelis W.^2 ; Hari, Sangeetha^2

Science Institute and Department of Chemistry, University of Iceland, Dunhaga 3, Reykjavik

107, Iceland^1

Department of Imaging Physics, Delft University of Technology, Lorentzweg 1, Delft

2628 CJ, Netherlands^2

关键词: Deposition process;    Dissociative electron attachment;    Dissociative ionization;    Efficient decomposition;    Focused electron beam induced deposition;    In contexts;    Low energy electrons;    Low energy secondary electrons;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/635/7/072088/pdf
DOI  :  10.1088/1742-6596/635/7/072088

来源: IOP

【 摘 要 】

To study the potential role of low energy secondary electrons in focused electron beam induced deposition (FEBID) we have studied FEBID using 1,1-dichloro-1-silacyclohexane, silacyclohexane and 1,3,5-trisilacyclohexane. While the first of these compounds shows appreciable cross sections for dissociative electron attachment (DEA) in the gas phase, DEA is not observed for the latter two. Dissociative ionization, on the other hand is a fairly efficient decomposition path for all three compounds. The performance of these compounds in FEBID is compared with their decomposition through low energy electrons in the gas phase and discussed in context to the role of DEA and DI in FEBID.