Electron-DNA interaction in the presence of copper ion: comparison with ironion case

29th International Conference on Photonic, Electronic, and Atomic Collisions

Noh, Hyung-Ah^1 ; Park, Yeun-Soo^2 ; Cho, Hyuck^1

Department of Physics, Chungnam National University, Daejeon

305-764, Korea, Republic of^1

Plasma Technology Research Center, National Fusion Research Institute, Gunsan

573-540, Korea, Republic of^2

关键词: Combined effect;    Copper ions;    DNA damages;    DNA interaction;    Iron ions;    Low energy electrons;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/635/7/072016/pdf
DOI  :  10.1088/1742-6596/635/7/072016

来源: IOP

【 摘 要 】

Combined effect of low-energy electron interaction and copper ion on DNA damage has been studied. And it has been compared with the previous study on iron ion.