Extended reverse Monte Carlo method for extracting optical constants of thin Ni film from reflection electron energy-loss spectroscopy

29th International Conference on Photonic, Electronic, and Atomic Collisions

Xu, H.^1 ; Da, B.^1 ; Mao, S.F.^2 ; Tokési, K.^3 ; Ding, Z.J.^1

Hefei National Laboratory for Physical Sciences at Microscale, Department of Physics, University of Science and Technology of China, Hefei, Anhui

230026, China^1

School of Nuclear Science and Technology, University of Science and Technology of China, Hefei, Anhui

230026, China^2

Institute for Nuclear Research, Hungarian Academy of Sciences (ATOMKI), Debrecen, Hungary^3

关键词: Bulk plasmons;    Computational data;    Energy loss function;    Ni films;    Nickel film;    Reflection electron energy loss spectroscopies;    Reverse Monte Carlo;    Reverse Monte Carlo method;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/635/6/062016/pdf
DOI  :  10.1088/1742-6596/635/6/062016

来源: IOP

【 摘 要 】

An extended reverse Monte Carlo (RMC) method for obtaining optical constants of ultrathin films and solids is presented. Our results show that this method works very well in extracting some exquisite information from experimentally measured reflection electron energy loss spectroscopy (REELS) spectra. The energy loss function (ELF) of 100 nm nickel film in a relatively larger energy loss range of 0-200 eV has been obtained, which agrees well with other computational data. Employing this ELF, individual contributions to REELS intensity due to surface and bulk plasmon excitations are quantitatively separated for further study.