Thin film thickness measurement error reduction by wavelength selection in spectrophotometry

International Scientific Seminars on "Fundamental and Applied Problems of Photonics and Condensed Matter Physics"

Tsepulin, Vladimir G.^1 ; Perchik, Alexey V.^1 ; Tolstoguzov, Victor L.^1 ; Karasik, Valeriy E.^1

Bauman Moscow State Technical University, 2nd Baumanskaya str.

5, Moscow

105005, Russia^1

关键词: High speed control;    Simple expression;    Thin-film structure;    Visual display;    Wavelength selection;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/584/1/012011/pdf
DOI  :  10.1088/1742-6596/584/1/012011

来源: IOP

【 摘 要 】

Fast and accurate volumetric profilometry of thin film structures is an important problem in the electronic visual display industry. We propose to use spectrophotometry with a limited number of working wavelengths to achieve high-speed control and an approach to selecting the optimal working wavelengths to reduce the thickness measurement error. A simple expression for error estimation is presented and tested using a Monte Carlo simulation. The experimental setup is designed to confirm the stability of film thickness determination using a limited number of wavelengths.