An analytical and computational study of a stochastic adsorption model with variable attachment and detachment rates

3rd International Conference on Mathematical Modeling in Physical Sciences

物理学;数学

Mazilu, D.A.^1 ; Schwen, E.M.^1 ; Mazilu, I.^1

Washington and Lee University, 204 W. Washington Street, Lexington

VA

24450, United States^1

关键词: Analytical results;    Attachment and detachments;    Computational studies;    Particle densities;    Physical systems;    Stochastic adsorption;    Time dependent;    Two-state;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/574/1/012087/pdf
DOI  :  10.1088/1742-6596/574/1/012087

来源: IOP

【 摘 要 】

We present a stochastic model for adsorption and evaporation of monomers with applications to optical coatings. We consider a general case of attachment and detachment rates dependent on the overall number of particles in the system. The model is applicable to all dimensions and topologies, and can describe a variety of two-state physical systems. We report analytical results for the time-dependent particle density. We compare our analytical results with experimental data and Monte Carlo simulations.