会议论文详细信息
3rd International Conference on Mathematical Modeling in Physical Sciences | |
An analytical and computational study of a stochastic adsorption model with variable attachment and detachment rates | |
物理学;数学 | |
Mazilu, D.A.^1 ; Schwen, E.M.^1 ; Mazilu, I.^1 | |
Washington and Lee University, 204 W. Washington Street, Lexington | |
VA | |
24450, United States^1 | |
关键词: Analytical results; Attachment and detachments; Computational studies; Particle densities; Physical systems; Stochastic adsorption; Time dependent; Two-state; | |
Others : https://iopscience.iop.org/article/10.1088/1742-6596/574/1/012087/pdf DOI : 10.1088/1742-6596/574/1/012087 |
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来源: IOP | |
【 摘 要 】
We present a stochastic model for adsorption and evaporation of monomers with applications to optical coatings. We consider a general case of attachment and detachment rates dependent on the overall number of particles in the system. The model is applicable to all dimensions and topologies, and can describe a variety of two-state physical systems. We report analytical results for the time-dependent particle density. We compare our analytical results with experimental data and Monte Carlo simulations.
【 预 览 】
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An analytical and computational study of a stochastic adsorption model with variable attachment and detachment rates | 2144KB | download |