A Stochastic Model of Particle Deposition and Evaporation for Ionic Self-Assembly of Thin Films

3rd International Conference on Mathematical Modeling in Physical Sciences

物理学;数学

Schwen, E.M.^1 ; Mazilu, I.^1 ; Mazilu, D.A.^1

Washington and Lee University, 204 W. Washington Street, Lexington

VA

24450, United States^1

关键词: Ionic self- assembly;    Mean field approximation;    Nanoparticle self-assembly;    Nanoparticle suspension;    Particle depositions;    Self assembled thin film;    Self assembly process;    Sequential adsorption;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/574/1/012043/pdf
DOI  :  10.1088/1742-6596/574/1/012043

来源: IOP

【 摘 要 】

We investigate nanoparticle self-assembly using a stochastic model based on cooperative sequential adsorption with evaporation mechanisms and aimed specifically at the creation of optical thin films. Applying the mean field approximation, we derive a rate equation for particle density. We solve directly for the particle density in both the steady state and time-dependent cases. The analytical results are compared to Monte Carlo simulations of the self-assembly process and to experimental data for self-assembled thin films. We relate our theoretical model to the final particle density for thin films created under varied nanoparticle suspension concentrations.