Gas sensing properties of very thin TiO2 films prepared by atomic layer deposition (ALD)

INERA Workshop: Transition Metal Oxide Thin Films-functional Layers in "Smart windows" and Water Splitting Devices

Boyadjiev, S.^1 ; Georgieva, V.^2 ; Vergov, L.^2 ; Baji, Zs^3 ; Gáber, F.^4 ; Szilágyi, I.M.^1,4

MTA-BME Technical Analytical Research Group, Szent Gellért tér 4., Budapest

H- 1111, Hungary^1

Georgi Nadjakov Institute of Solid State Physics, Bulgarian Academy of Sciences, blvd Tzarigradsko chaussee 72, Sofia

1784, Bulgaria^2

Hungarian Academy of Sciences, Research Centre for Natural Sciences, Institute of Technical Physics and Materials Science, Konkoly Thege M. út 2933, Budapest

H-1121, Hungary^3

Budapest University of Technology and Economics, Department of Inorganic and Analytical Chemistry, Szent Gellért ter 4, Budapest

H-1111, Hungary^4

关键词: Cost-effective technology;    Gas sensing properties;    Low concentrations;    Prototype structures;    TiO2 film;    Titanium dioxides (TiO2);   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/559/1/012013/pdf
DOI  :  10.1088/1742-6596/559/1/012013

来源: IOP

【 摘 要 】

Very thin titanium dioxide (TiO2) films of less than 10 nm were deposited by atomic layer deposition (ALD) in order to study their gas sensing properties. Applying the quartz crystal microbalance (QCM) method, prototype structures with the TiO2ALD deposited thin films were tested for sensitivity to NO2. Although being very thin, the films were sensitive at room temperature and could register low concentrations as 50-100 ppm. The sorption is fully reversible and the films seem to be capable to detect for long term. These initial results for very thin ALD deposited TiO2films give a promising approach for producing gas sensors working at room temperature on a fast, simple and cost-effective technology.