Comparative analysis of electrophysical properties of ceramic tantalum pentoxide coatings, deposited by electron beam evaporation and magnetron sputtering methods

18th International School on Condensed Matter Physics: "Challenges of Nanoscale Science: Theory, Materials, Applications"

Donkov, N.^1 ; Mateev, E.^1 ; Safonov, V.^2 ; Zykova, A.^2 ; Yakovin, S.^3 ; Kolesnikov, D.^4 ; Sudzhanskaya, I.^4 ; Goncharov, I.^4 ; Georgieva, V.^5

Emil Djakov Institute of Electronics, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee, Sofia

1784, Bulgaria^1

National Science Center, Kharkov Institute of Physics and Technology, 1 Academicheskaya Str., Kharkov

61108, Ukraine^2

Department of Physical, Technologies Kharkov National University, 4 Svobody Sq., 61077 Kharkov, Ukraine^3

Belgorod State National Research University, 85 Pobedy St., Belgorod

308015, Russia^4

Georgi Nadjakov Institute of Solid State Physics, Bulgarian Academy of Sciences, Tzarigradsko Chausse 72, Sofia

1784, Bulgaria^5

关键词: Comparative analysis;    Dielectric parameters;    Electron beam evaporation;    Electrophysical properties;    Magnetron sputtering method;    Magnetron sputtering process;    Stoichiometric compositions;    X-ray diffraction measurements;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/558/1/012036/pdf
DOI  :  10.1088/1742-6596/558/1/012036

来源: IOP

【 摘 要 】

Ta2O5ceramic coatings have been deposited on glass substrates by e-beam evaporation and magnetron sputtering methods. For the magnetron sputtering process Ta target was used. X-ray diffraction measurements show that these coatings are amorphous. XPS survey spectra of the ceramic Ta2O5coatings were obtained. All spectra consist of well-defined XPS lines of Ta 4f, 4d, 4p and 4s; O 1s; C 1s. Ta 4f doublets are typical for Ta2O5coatings with two main peaks. Scanning electron microscopy and atomic force microscopy images of the e-beam evaporated and magnetron sputtered Ta2O5ceramic coatings have revealed a relatively flat surface with no cracks. The dielectric properties of the tantalum pentoxide coatings have been investigated in the frequency range of 100 Hz to 1 MHz. The electrical behaviour of e-beam evaporated and magnetron sputtered Ta2O5ceramic coatings have also been compared. The deposition process conditions principally effect the structure parameters and electrical properties of Ta2O5ceramic coatings. The coatings deposited by different methods demonstrate the range of dielectric parameters due to the structural and stoichiometric composition changes