Features of silicon-containing coatings deposition from ablation plasma formed by a powerful ion beam

International Congress on Energy Fluxes and Radiation Effects

Sazonov, R.^1 ; Kholodnaya, G.^1 ; Ponomarev, D.^1 ; Remnev, G.^1 ; Khailov, I.^1

National Research Tomsk Polytechnic University, Lenin Avenue, 30, Tomsk, Russia^1

关键词: Ablation plasma;    Beam composition;    Coatings deposition;    Experimental research;    Ion accelerator;    Ion current density;    Laboratory set-up;    Pressed powders;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/552/1/012025/pdf
DOI  :  10.1088/1742-6596/552/1/012025

来源: IOP

【 摘 要 】

This paper presents the research of features of silicon-containing coatings deposition from ablation plasma, which is formed by a powerful ion beam at the influence on a microsized pressed powder of SiO2. Experimental research have been conducted with a laboratory setup based on a TEMP-4M pulsed ion accelerator in a double-pulse forming mode; the first is negative (300-500 ns, 100-150 kV), and the second is positive (150 ns, 250-300 kV). A beam composition: C+ions (60-70 %) and protons, the ion current density on the target is 25±5 A/cm2. An electron self-magnetically insulated diode has been used to generate the ion beam in the TEMP-4M accelerator. The properties of obtained silicon-containing films have been analyzed with the help of IR spectroscopy. A surface structure has been studied by the method of scanning electron microscopy.