Bias-assisted magnetron sputtering of yttria-stabilised zirconia thin films

International Congress on Energy Fluxes and Radiation Effects

Solovyev, A.A.^1 ; Rabotkin, S.V.^2 ; Ionov, I.V.^2 ; Shipilova, A.V.^2 ; Kovalchuk, A.N.^1 ; Borduleva, A.O.^1

Tomsk Polytechnic University, 30 Lenin Ave., Tomsk

634050, Russia^1

Institute of High Current Electronics SB RAS, 2/3 Akademichesky Ave., Tomsk

634055, Russia^2

关键词: Columnar thin films;    Deposition Parameters;    Film morphology;    Fuel cell anodes;    Reactive magnetron sputtering;    Substrate bias voltages;    Substrate heating;    Yttria-stabilized zirconia thin films;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/552/1/012010/pdf
DOI  :  10.1088/1742-6596/552/1/012010

来源: IOP

【 摘 要 】

Cubic yttria-stabilized zirconia (YSZ) thin films were deposited by reactive magnetron sputtering on NiO-YSZ fuel cell anodes under different conditions. The influence of substrate bias voltage, temperature and porosity on texture and morphology of the deposited films were investigated. Comparing film morphology of YSZ grown on NiO-YSZ anodes, it was found that films deposited on a substrate with a large porosity were columnar and contained voids regardless of the deposition parameters. It was shown that only using of anode support with very high surface quality, substrate heating up to 500 °C and pulsed substrate bias (about -30 V MF) during film deposition is necessary for deposition of non-columnar thin films without voids and cracks that may be suitable for SOFC application.