Ion trajectories calculation for negatively biased needle cathode in volume discharge plasma

International Congress on Energy Fluxes and Radiation Effects

Remnev, A.G.^1,3 ; Uemura, K.^1 ; Kozyrev, A.V.^2 ; Lopatin, V.V.^3

ITAC Ltd., Shinmaywa 1-1, Takarazuka

665-0052, Japan^1

National Research Tomsk State University, Lenin Avenue 36, Tomsk

634050, Russia^2

Institute of High Technology Physics, Lenin Avenue 2a, Tomsk

634050, Russia^3

关键词: Electrical field distributions;    Etching profile;    Gap parameter;    Ion current density;    Ion trajectories;    Planar plasma;    Single-particle analysis;    Volume discharges;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/552/1/012009/pdf
DOI  :  10.1088/1742-6596/552/1/012009

来源: IOP

【 摘 要 】

Ion trajectories were simulated for the case of multi-needle negatively biased electrode immerged into the volume type plasma. The model was simplified to the 2d case with planar plasma boundary. The electrical field distribution was calculated with the FEA method. Resulting piece wise function was then used to predict ion trajectories emitted from the plasma sheath boundary. Series of the ion trajectories were simulated for different plasma and accelerating gap parameters using single particle analysis. Distribution of the ion current density along the needle surface and angles of the ion incidence were obtained from the simulation. Experimental and theoretical etching profiles are consistent.