Plasmonic Enhancement at Metal Atoms on Graphene Edges revealed by EFTEM

Electron Microscopy and Analysis Group Conference 2013

Pierce, W.^1 ; Zan, R.^1 ; Ramasse, Q.M.^2 ; Boothroyd, C.B.^3 ; Bangert, U.^1

School of Materials, University of Manchester, Manchester, United Kingdom^1

SuperSTEM, STFC Daresbury Laboratory, Warrington, United Kingdom^2

Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons, Peter Gruenberg Institute, Juelich Research Centre, D-52425 Juelich, Germany^3

关键词: Catalyse;    Electric field enhancement;    Energy-filtered imaging;    Etching process;    Graphene edges;    Low-loss;    Metal atoms;    Plasmonic enhancements;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/522/1/012078/pdf
DOI  :  10.1088/1742-6596/522/1/012078

来源: IOP

【 摘 要 】

Palladium atoms have been deposited onto graphene where they catalyse etching processes in conjunction with the e-beam, during/after which they reside at the edges of the holes, which have formed in the graphene. Energy filtered imaging reveals that the low loss feature at 2-4 eV constituting the shoulder of the graphene n-plasmon, is up to 10 times enhanced at Pd-decorated graphene edges compared to clean monolayer graphene, rendering it a useful feature for electric field enhancement applications in the optical regime