PLD fabrication of ZnO nanostructures on metal-coated substrates

18th International Summer School on Vacuum, Electron and Ion Technologies

Dikovska, A Og^1 ; Koleva, M.E.^1 ; Atanasova, G.B.^2 ; Stoyanchov, T.R.^1 ; Nedyalkov, N.N.^1 ; Atanasov, P.A.^1

Acad. E. Djakov Institute of Electronics, Bulgarian Academy of Sciences, 72 Tsarigradsko Chaussee, 1784 Sofia, Bulgaria^1

Institute of General and Inorganic Chemistry, Bulgarian Academy of Sciences, Acad. G. Bonchev Str., Bl. 11, 1113 Sofia, Bulgaria^2

关键词: Catalyst layers;    Oxygen pressure;    Process parameters;    Process temperature;    Silicon substrates;    Substrate temperature;    Thin-film depositions;    ZnO nanostructures;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/514/1/012032/pdf
DOI  :  10.1088/1742-6596/514/1/012032

来源: IOP

【 摘 要 】

In this work, ZnO nanostructures were fabricated on metal (a metal alloy containing Fe, Cr, Mn and Ni) coated silicon substrates by applying pulsed laser deposition. The samples were prepared at substrate temperatures in the range of 550-650 °C, oxygen pressure of 5 Pa, and laser fluence ≤ 1 J cm-2i.e., process parameters usually used for thin-film deposition. We found that the metal layer's role is substantial in the preparation of nanostructures, the morphology of the catalyst layer determines the growth of the ZnO nanowalls and the increase of the process temperature leads to nanorods formation on the nanowalls.