High harmonics generation at the interaction of an intense fs laser pulse with an overdense plasma layer

Plasma Physics by Laser and Applications 2013 Conference

Mihailescu, A.^1 ; Stancalie, V.^1 ; Pais, V.^1

National Institute for Laser, Plasma and Radiation Physics, PO Box MG-36, 077125, Magurele, Romania^1

关键词: Generation mechanism;    High harmonics generations;    High order harmonics;    Intense laser pulse;    Laser parameters;    Overdense plasma;    Theoretical study;    Wavelength ranges;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/508/1/012019/pdf
DOI  :  10.1088/1742-6596/508/1/012019

来源: IOP

【 摘 要 】

Harmonics generated with fs laser pulses are not only among the most intense sources in the wavelength range of a few tens of nanometers but also a far better source than X-ray lasers from the coherence point of view. It is anticipated, that in the near future, the harmonics issued from femtosecond laser-produced plasmas will represent a coherent source much brighter than all other XUV sources apart from the XFEL. These particular aspects, correlated with the fact that high order harmonics produced by reflection of an ultrashort and intense laser pulse on an overdense plasma layer impose virtually no restrictions on the intensity of the laser employed, lead the way to a series of potential applications in plasma diagnostics and nonlinear optics. This work presents a theoretical study on the high harmonics generation mechanism occurring at the reflection of a femtosecond Ti-Sapphire terawatt laser pulse (λ0 = 0.8 μm and pulse durations around 100-150 fs) on an overdense steep Al plasma layer. Insights on how different laser parameters influence this generation mechanism and its efficiency are provided.