Verification of Thermo-Fluidic CVD Reactor Model

Microtechnology and Thermal Problems in Electronics

物理学;无线电电子学

Lisik, Z.^1 ; Turczynski, M.^1 ; Ruta, L.^1 ; Raj, E.^1

Lodz University of Technology, Department of Semiconductor and Optoelectronic Devices, Wolczanska 211/215, 90-924 Lodz, Poland^1

关键词: ANSYS-CFX;    Chemical vapour deposition;    CVD reactors;    Gas flowrate;    Heat and mass transfer;    Numerical approaches;    Numerical results;    Reactor chamber;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/494/1/012020/pdf
DOI  :  10.1088/1742-6596/494/1/012020

来源: IOP

【 摘 要 】

Presented paper describes the numerical model of CVD (Chemical Vapour Deposition) reactor created in ANSYS CFX, whose main purpose is the evaluation of numerical approaches used to modelling of heat and mass transfer inside the reactor chamber. Verification of the worked out CVD model has been conducted with measurements under various thermal, pressure and gas flow rate conditions. Good agreement between experimental and numerical results confirms correctness of the elaborated model.