Absolute measurement of low energy electron-induced strand-break damage in films of plasmid DNA and plasmid DNA/Dap2+ complexes

28th International Conference on Photonic, Electronic and Atomic Collisions

Boulanouar, O.^1 ; Rezaee, M.^2 ; Fromm, M.^1 ; Cloutier, P.^2 ; Zheng, Y.^3 ; Bass, A.D.^2 ; Michaud, M.^2 ; Hunting, D.J.^2 ; Sanche, L.^2

Laboratoire de Chimie Physique et Rayonnements - Alain Chambaudet, LRC CEA, Université de Franche-Comté, 16 route de Gray, Besançon cedex

F-25030, France^1

Départment de Médecine Nucléaire et Radiobiologie, Faculté de Médecine et des Sciences de la Santé, Université de Sherbrooke, Sherbrooke

QC

J1H 5N4, Canada^2

Research Institute of Photocatalysis, State Key Laboratory, Fuzhou University, Fuzhou

350002, China^3

关键词: Absolute measurements;    Diaminopropane;    Electron transmission;    Induced damage;    Low energy electrons;    Plasmid DNA;    Simple modeling;    Strand breaks;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/488/5/052030/pdf
DOI  :  10.1088/1742-6596/488/5/052030

来源: IOP

【 摘 要 】

A simple model of electron transmission in thin film targets permits absolute measurement of cross section for electron-induced damage in such films of DNA and DNA complexed with 1-3 diaminopropane.