Damage study of optical substrates using 1-μm-focusing beam of hard X-ray free-electron laser

11th International Conference on X-ray Microscopy

Koyama, T.^1 ; Yumoto, H.^1 ; Senba, Y.^1 ; Tono, K.^1 ; Sato, T.^2 ; Togashi, T.^1 ; Inubushi, Y.^2 ; Kim, J.^3 ; Kimura, T.^4 ; Matsuyama, S.^3 ; Mimura, H.^5 ; Yabashi, M.^2 ; Yamauchi, K.^3 ; Ohashi, H.^1 ; Ishikawa, T.^2

JASRI/SPring-8, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan^1

RIKEN SPring-8 Center, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5148, Japan^2

Department of Precision Science and Technology, Faculty of Engineering, Osaka University, 2-1 Yamada-oka, Osaka 565-0871, Suita, Japan^3

Research Institute for Electronic Science, Hokkaido University, Kita 21 Nishi 10, Kita-ku, Sapporo 001-0021, Japan^4

Graduate School of Engineering, University of Tokyo, 7-3-1, Hongo, Bunkyo-ku, Tokyo 113-8656, Japan^5

关键词: Ablation thresholds;    Beam size;    Hard X ray;    Optical substrates;    Photon energy;    Synthetic fused silica;    X ray mirrors;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/463/1/012043/pdf
DOI  :  10.1088/1742-6596/463/1/012043

来源: IOP

【 摘 要 】

We evaluated the ablation threshold of silicon and synthetic fused silica, which are widely used as optical substrates such as those in X-ray mirrors. A focusing XFEL beam with a beam size of approximately 1 μm at a photon energy of 10 keV was used. We confirmed that the ablation thresholds of these materials, which were 0.8 μJ/μm2for the silicon and 4 μJ/μm2for the synthetic fused silica, approximately agreed with the melting dose.