Observation of a microwave bandgap in a one-dimensionally periodic low-pressure plasma structure

11th Asia Pacific Conference on Plasma Science and Technology;25th Symposium on Plasma Science for Materials

Takahashi, Kazunori^1,2,3 ; Miyamoto, Kazuaki^2

Department of Electrical Engineering, Tohoku University, Sendai 980-8579, Japan^1

Department of Electric Engineering and Computer Science, Iwate University, Morioka 020-8551, Japan^2

Soft-Path Engineering Research Center, Iwate University, Morioka 020-8551, Japan^3

关键词: Capacitively coupled discharges;    Density ratio;    Low pressure plasma;    Lower density;    Maximum density;    Rf-power;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/441/1/012011/pdf
DOI  :  10.1088/1742-6596/441/1/012011

来源: IOP

【 摘 要 】

One-dimensionally periodic structure of plasma density is produced by a 400 kHz capacitively coupled discharge in 15 Pa argon. The maximum density can be increased up to above 1010-1011cm-3by increasing the rf power. The density ratio between the higher and lower density layers is maintained at about 0.7 in the present configuration. The transmittance of the microwave in the GHz range is measured and simply calculated. The results indicate the presence of the bandgap near about 3 GHz, which originates in the periodic structure.