Effect of bias voltage on microstructure and properties of magnetron sputtering TaN coating

2019 3rd International Workshop on Renewable Energy and Development

能源学;生态环境科学

Yubao, Zhang^1^2 ; Zhigang, Li^1^2 ; Jinfeng, Li^1 ; Nan, Zhang^1 ; Hongtao, Zhao^1^2

Technical Physics Institute of Heilongjiang Academy of Sciences, Harbin

150086, China^1

Institute of Advanced Technology of Heilongjiang Academy of Sciences, Harbin

150020, China^2

关键词: Binding forces;    Coating-substrate;    Four-point;    Microstructure and properties;    Minimum value;    Preferential orientation;    Square resistance;   

Others  :  https://iopscience.iop.org/article/10.1088/1755-1315/267/4/042126/pdf
DOI  :  10.1088/1755-1315/267/4/042126

学科分类：环境科学（综合）

来源: IOP

【 摘 要 】

A series of TaN films were coated on Al2O3 at various bias voltages by magnetron sputtering technique. Effect of bias voltage on the microstructure, roughness, deposition rate, binding force of coating-substrate, electrical properties of the TaN coating were investigated by X-ray diffraction (XRD), atomic force microscope (AFM), profile meter, scratch tester and four points probe respectively. The results suggest that the TaN coating were formed by face-center δ-TaN crystals and the preferential orientation of the coatings varied with the bias voltage; the deposition rate and the binding force of coating-substrate reached maximum value of 5.71nm/min and 4.5N when the bias voltage was 80 V, the roughness and the square resistance reached the minimum value of 0.509nm and 15.58Ω/