Ablation morphology and redistribution layer of gold films with different substrates irradiated by femtosecond laser pulse

2019 2nd International Conference on Advanced Materials, Intelligent Manufacturing and Automation

Xu, Zhijie^1

Laser Micro/Nano Fabrication Laboratory, School of Mechanical Engineering, Beijing Institute of Technology, Beijing

100081, China^1

关键词: Characterization methods;    Comparative studies;    Different substrates;    Engineering fields;    Gaussian pulse;    High-efficiency;    Micro/nanostructures;    Redistribution layers;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/569/2/022027/pdf
DOI  :  10.1088/1757-899X/569/2/022027

来源: IOP

【 摘 要 】

Gold micro/nanostructure is of great significance in many scientific and engineering fields for its unique optical, electrical and thermal properties. Gold film deposited through electron beam (EB) evaporation is a suitable raw material for the fabrication of gold micro/nanostructure. Femtosecond laser directing is one of the reported methods for high-efficiency and low-cost micro/nanofabrication. We present a comparative study of gold film ablation with different substrates (Si, SiO2, ZnO) under the irradiation of single femtosecond Gaussian pulse. The morphologies of ablation areas and redistribution layers are investigated by many characterization methods, such as scanning electron microscopy (SEM) and atomic force microscopy (AFM). In general, the ablation morphology and the ablation hole are mainly affected by the bandgap. Besides, the heat conductivity is the main factor affecting the width and height of the redistribution layer.