Copper Thin Film Deposited By PVD on Aluminum AA4015 Substrate for Thermal Solar Application

2nd International Conference on Sustainable Engineering Techniques

工业技术（总论）

Kadhim, Mohammed J.^1 ; Sukkar, Khalid A.^2 ; Abbas, Ahmed S.^1

Production and Metallurgy Engineering Department University of Technology, Baghdad, Iraq^1

Chemical Engineering, University of Technology, Baghdad, Iraq^2

关键词: Aluminum substrate;    Chemical component;    Chemical compositions;    Coating parameters;    Copper nanoparticles;    Different thickness;    Solar thermal applications;    Thermal absorptions;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/518/3/032048/pdf
DOI  :  10.1088/1757-899X/518/3/032048

学科分类：工业工程学

来源: IOP

【 摘 要 】

The copper nanoparticles (CuNP) films have been deposited on Aluminum-4015 substrate by PVD technique. Structural of thin film layer achieved have been analyzed by X-ray diffraction (XRD). While the chemical composition percentage of the multilayers (Zn-Ni) combined with thin layer and substrate evaluated via ED-XRF, other characterization likes surface morphology have been investigated by using scanning electron microscopy (SEM), FESM and AFM. Optical properties especially thermal absorption was measured in the UV/Vis range. The effect of coating parameter like time coating resulting different thickness thin film (50,100 and 150) nm deposited on Aluminum substrate have been studied and the influence on optical properties. SEM analysis and AFM results show that prepared films were denser with nanosize grains between (26-54) nm. Also, XRD results show nano copper was the main chemical component in the films. The films prepared by this technique have better optical properties like good absorption ranged between (87%-97%). Decreasing the emittance and increase the absorption leads finally achieve a good selectivity coating using in the solar thermal application.