Influence of fluorine and oxygen atom adsorption on electronic structure of InSb(111) surface

Functional Materials and Nanotechnologies 2018

Fuks, A.A.^1 ; Bakulin, A.V.^1^2 ; Kulkova, S.E.^1^2

National Research Tomsk State University, pr. Lenina 36, Tomsk

634050, Russia^1

Institute of Strength Physics and Materials Science, Russian Academy of Sciences, Siberian Branch, pr. Akademichesky 2/4, Tomsk

634055, Russia^2

关键词: CO adsorption;    Fluorine atoms;    Fluorine concentrations;    Near-surface layers;    Oxygen adsorption;    Oxygen atom;    Projector augmented waves;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/503/1/012004/pdf
DOI  :  10.1088/1757-899X/503/1/012004

来源: IOP

【 摘 要 】

The projector augmented-wave method was applied for investigation of oxygen and fluorine atom adsorption on the InSb(111) surface depending on its termination. It was shown that oxygen adsorption leads to appearance of additional surface states in the fundamental gap in case of the In-terminated surface while the density of surface states decreases for the Sb-terminated surface. Fluorine co-adsorption results in partial or complete removal of the surface state and an unpinning of the Fermi level. The increase of fluorine concentration leads to considerable changes of the near-surface-layer structure due to the penetration of both electronegative adsorbates (O and F) into the substrate.